磁控濺射法沉積TCO薄膜的電源技術(shù)
作者：陳宇 廣東志成冠軍集團(tuán)有限公司 上傳時(shí)間：2012/9/14 16:31:42
摘要：電源在磁控濺射法制備透明導(dǎo)電氧化物（TCO）薄膜的技術(shù)中起著重要的作用。本文重點(diǎn)介紹了磁控濺射TCO薄膜的電源技術(shù)發(fā)展現(xiàn)狀及進(jìn)展，首先簡(jiǎn)要說(shuō)明了目前應(yīng)用最廣泛的直流電源技術(shù)及具備滅弧能力的脈沖電源技術(shù)的原理和主要優(yōu)缺點(diǎn)。進(jìn)一步的，介紹了具備快速滅弧補(bǔ)償功能的新型直流電源技術(shù)和模塊化電源技術(shù)。最后進(jìn)一步分析了代表新一代技術(shù)的高功率脈沖磁控濺射（HPPMS）電源的基本原理和優(yōu)良特性，并指出其發(fā)展所面臨的挑戰(zhàn)。
敘詞：TCO薄膜 磁控濺射 電源 HPPMS Abstract：The power source play an important role for magnetron sputtering of the transparent conductive oxides (TCO). This paper introduces the conventional DC power source and pulsed power source for magnetron sputtering of the TCO at first. Then the newly developed modular power source and the DC power source with a fast arc elimination function and an arc compensation technology are introduced. Furthermore, the principle, characteristic and challenge of high power pulsed magnetron sputtering HPPMSpower source which is regarded as the new generation power source of magnetron sputtering is discussed. Keyword：TCO Thin films , Magnetron sputtering , Power source , HPPMS
敘詞：TCO薄膜 磁控濺射 電源 HPPMS Abstract：The power source play an important role for magnetron sputtering of the transparent conductive oxides (TCO). This paper introduces the conventional DC power source and pulsed power source for magnetron sputtering of the TCO at first. Then the newly developed modular power source and the DC power source with a fast arc elimination function and an arc compensation technology are introduced. Furthermore, the principle, characteristic and challenge of high power pulsed magnetron sputtering HPPMSpower source which is regarded as the new generation power source of magnetron sputtering is discussed. Keyword：TCO Thin films , Magnetron sputtering , Power source , HPPMS
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